When you’re manufacturing high-tech products, the smallest things can have huge impacts on yield and performance. Philips Innovation labs offers a broad range of trace analysis and contamination control services ensure you know what is happening in your processes down at the smallest levels. We can help you contamination control issues as diverse as analyzing supply gases at the ppq levels and sub-monolayer analysis of wafer surfaces.
Moreover, you can call on us to solve problems at your site or provide routine analyses for existing products and processes. And we are at the forefront of developing new techniques to address specific challenges – such as combining 2D-FTIR (Fourier transform infrared spectroscopy) and chemometric data analysis to locate and identify micron-sized organic contaminant particles.
Our extensive trace analysis services include advanced techniques such as (X-ray photoelectron spectroscopy), Auger emission spectroscopy, TOFSIMS (time-of-flight secondary ion mass spectroscopy) and LA-ICP-MS (laser-ablation inductively coupled plasma mass spectrometry). Moreover, you can rely on our experts for support and advice to ensure you find the right analytical solution for your needs.